[Hyderabad, June 13th, 2025] - Clearview Market Insights announces that the global photoacid generator (PAG) market will grow to USD 1,180 million by 2031, rising at a CAGR of 9.3% from USD 635 million in 2024. With strong tailwinds from semiconductor scaling and 3D printing, PAGs are becoming essential components in advanced material and device manufacturing.

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Used extensively in photolithography and nano-imaging, PAGs release acid upon light exposure to create patterns in photoresist layers. With chipmakers transitioning to 5nm and 3nm nodes, EUV-capable PAGs are in particularly high demand. Equally, biomedical engineering, smart coatings, and printed electronics are generating new use cases for hybrid and visible-light-sensitive PAGs.

The entire photoresist ecosystem is transforming, and PAGs are at the center," said a CVMI analyst. "We expect notable growth in both semiconductor fabs and biomedical photopolymer applications.

Top companies such as TOK, Fujifilm, IGM Resins, and San-Apro are advancing with Gen3 PAGs, dual-function initiators, and EUV-optimized blends. TOK’s recent EUV PAG compatible with the 3nm node and IGM’s biofriendly 3D printing PAGs illustrate this technological diversification.

Asia-Pacific continues to dominate, accounting for nearly half the market due to fab expansion in Taiwan, South Korea, and China. North America leads in innovation and process control, while Europe remains strong in MEMS and advanced packaging.

The market is expected to benefit from the growing convergence of electronics, life sciences, and photopolymer materials. Future opportunities lie in encapsulated PAGs for drug delivery, low-bleedout lithographic systems, and AI-designed photoresist blends.

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